Degradation of antipyrine by UV, UV/H2O2 and UV/PS

Chaoqun Tan, Naiyun Gao, Yang Deng, Yongji Zhang, Minghao Sui, Jing Deng, Shiqing Zhou

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151 Scopus citations

Abstract

Degradation of antipyrine (AP) in water by three UV-based photolysis processes (i.e., direct UV, UV/H2O2, UV/persulfate (UV/PS)) was studied. For all the oxidation processes, the AP decomposition exhibited a pseudo-first-order kinetics pattern. Generally, UV/H2O2 and UV/PS significantly improved the degradation rate relevant to UV treatment alone. The pseudo-first-order degradation rate constants (kobs) were, to different degrees, affected by initial AP concentration, oxidant dose, pH, UV irradiation intensity, and co-existing chemicals such as humic acid, chloride, bicarbonate, carbonate and nitrate. The three oxidation processes followed the order in terms of treatment costs: UV/PS>UV>UV/H2O2 if the energy and chemical costs are considered. Finally, the AP degradation pathways in the UV/H2O2 and UV/PS processes are proposed. Results demonstrated that UV/H2O2 and UV/PS are potential alternatives to control water pollution caused by emerging contaminants such as AP.

Original languageEnglish
Pages (from-to)1008-1016
Number of pages9
JournalJournal of Hazardous Materials
Volume260
DOIs
Publication statusPublished - 15 Sep 2013

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Keywords

  • Antipyrine
  • Degradation products
  • Influencing factor
  • Kinetics

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