Degradation of antipyrine by UV, UV/H2O2 and UV/PS

Chaoqun Tan, Naiyun Gao, Yang Deng, Yongji Zhang, Minghao Sui, Jing Deng, Shiqing Zhou

Research output: Contribution to journalArticle

142 Citations (Scopus)

Abstract

Degradation of antipyrine (AP) in water by three UV-based photolysis processes (i.e., direct UV, UV/H2O2, UV/persulfate (UV/PS)) was studied. For all the oxidation processes, the AP decomposition exhibited a pseudo-first-order kinetics pattern. Generally, UV/H2O2 and UV/PS significantly improved the degradation rate relevant to UV treatment alone. The pseudo-first-order degradation rate constants (kobs) were, to different degrees, affected by initial AP concentration, oxidant dose, pH, UV irradiation intensity, and co-existing chemicals such as humic acid, chloride, bicarbonate, carbonate and nitrate. The three oxidation processes followed the order in terms of treatment costs: UV/PS>UV>UV/H2O2 if the energy and chemical costs are considered. Finally, the AP degradation pathways in the UV/H2O2 and UV/PS processes are proposed. Results demonstrated that UV/H2O2 and UV/PS are potential alternatives to control water pollution caused by emerging contaminants such as AP.

Original languageEnglish
Pages (from-to)1008-1016
Number of pages9
JournalJournal of Hazardous Materials
Volume260
DOIs
StatePublished - 15 Sep 2013

Fingerprint

Antipyrine
Degradation
degradation
Water pollution control
oxidation
Oxidation
Photolysis
Water Pollution
Humic Substances
photolysis
Oxidants
bicarbonate
cost
water pollution
oxidant
humic acid
Dosimetry
Carbonates
Costs
Nitrates

Keywords

  • Antipyrine
  • Degradation products
  • Influencing factor
  • Kinetics

Cite this

Tan, Chaoqun ; Gao, Naiyun ; Deng, Yang ; Zhang, Yongji ; Sui, Minghao ; Deng, Jing ; Zhou, Shiqing. / Degradation of antipyrine by UV, UV/H2O2 and UV/PS. In: Journal of Hazardous Materials. 2013 ; Vol. 260. pp. 1008-1016.
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abstract = "Degradation of antipyrine (AP) in water by three UV-based photolysis processes (i.e., direct UV, UV/H2O2, UV/persulfate (UV/PS)) was studied. For all the oxidation processes, the AP decomposition exhibited a pseudo-first-order kinetics pattern. Generally, UV/H2O2 and UV/PS significantly improved the degradation rate relevant to UV treatment alone. The pseudo-first-order degradation rate constants (kobs) were, to different degrees, affected by initial AP concentration, oxidant dose, pH, UV irradiation intensity, and co-existing chemicals such as humic acid, chloride, bicarbonate, carbonate and nitrate. The three oxidation processes followed the order in terms of treatment costs: UV/PS>UV>UV/H2O2 if the energy and chemical costs are considered. Finally, the AP degradation pathways in the UV/H2O2 and UV/PS processes are proposed. Results demonstrated that UV/H2O2 and UV/PS are potential alternatives to control water pollution caused by emerging contaminants such as AP.",
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Degradation of antipyrine by UV, UV/H2O2 and UV/PS. / Tan, Chaoqun; Gao, Naiyun; Deng, Yang; Zhang, Yongji; Sui, Minghao; Deng, Jing; Zhou, Shiqing.

In: Journal of Hazardous Materials, Vol. 260, 15.09.2013, p. 1008-1016.

Research output: Contribution to journalArticle

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AU - Gao, Naiyun

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AU - Sui, Minghao

AU - Deng, Jing

AU - Zhou, Shiqing

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