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High dielectric constant Hf-Sn-Ti-O thin films
L. F. Schneemeyer
, R. B. Van Dover
, R. M. Fleming
Chemistry and Biochemistry
Research output
:
Contribution to journal
›
Article
›
peer-review
59
Scopus citations
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Keyphrases
Breakdown Field
50%
Compositional Spread
50%
Dielectric Constant
50%
Dielectric Properties
50%
High Dielectric Constant
100%
Leakage Current
50%
Processing Conditions
50%
Specific Capacitance
50%
Thick Film
50%
Thin Film Materials
50%
Ti-O
100%
Engineering
Breakdown Field
33%
Dielectrics
33%
Excellent Dielectric Property
33%
Figure of Merit
33%
Film Material
33%
High Dielectric Constant
100%
Processing Condition
33%
Thin Films
100%
Material Science
Capacitance
33%
Dielectric Property
33%
Permittivity
100%
Thick Films
33%
Thin Films
100%
Chemical Engineering
Film
100%