Laser and Thermal Vapor Deposition of Metal Sulfide (NiS, PdS) Films and in Situ Gas-Phase Luminescence of Photofragments from M(S₂COCHMe₂)₂

Keyphrases

• In Situ 100%
• Gas Phase 100%
• Metal Sulfide 100%
• Luminescence 100%
• Thermal Vapor Deposition 100%
• Metal Deposition 100%
• Photofragment 100%
• Tetragonal Phase 50%
• Low Temperature 25%
• Scanning Electron Microscopy 25%
• Sulfur 25%
• Metal Atoms 25%
• Analytical Tools 25%
• Deposition Process 25%
• Vapor Deposition 25%
• X-ray Diffraction Pattern 25%
• Si Substrate 25%
• Thermal Process 25%
• Photochemical Deposition 25%
• Sublimation Temperature 25%
• Highly Oriented 25%
• Sulfide Films 25%
• Rutherford Backscattering Technique 25%
• Single-source Precursor 25%
• Rhombohedral Phase 25%
• Quartz Substrate 25%
• Elemental Components 25%
• Laser Irradiation 25%
• Emission Spectroscopy 25%
• X-ray Photoelectron 25%

Engineering

• Gas-Phase 100%
• Vapor Deposition 100%
• Thin Films 50%
• Polycrystalline 50%
• Low-Temperature 25%
• Single Source 25%
• Metal Atom 25%
• Torr 25%
• Laser Irradiation 25%
• Thermal Process 25%
• Photoelectron 25%
• Phase Emission 25%
• Deposition Process 25%
• X-Ray Diffraction Pattern 25%
• Silicon Dioxide 25%

Material Science

• Film 100%
• Luminescence 100%
• Thin Films 33%
• Scanning Electron Microscopy 16%
• Surface (Surface Science) 16%
• X-Ray Diffraction 16%
• Emission Spectroscopy 16%
• Diffraction Pattern 16%
• Vapor Phase Deposition 16%