Robust porous polymers enabled by a fast trifluoroacetic acid etch with improved selectivity for polylactide

Keyphrases

• Enhanced Selectivity 100%
• Polylactide 100%
• Acid Etching 100%
• Porous Polymers 100%
• Trifluoroacetic Acid 100%
• Etching Rate 66%
• Thick Film 33%
• Complete Removal 33%
• Block Copolymer 33%
• Polystyrene 33%
• Lactide 33%
• High Etch Rate 33%
• KOH Etching 33%
• Etchant 33%
• Etching Strategy 33%
• Etch Selectivity 33%
• Block Copolymer Films 33%
• Selective Processes 33%

Material Science

• Polylactide 100%
• Block Copolymer 66%
• Film 33%
• Thin Films 33%
• Nuclear Magnetic Resonance 33%
• Thick Films 33%
• Scanning Electron Microscopy 33%
• Polystyrene 33%
• Gel Permeation Chromatography 33%

Chemical Engineering

• Trifluoroacetic Acid 100%
• Film 100%
• Block Copolymer 66%
• Polystyrene 33%
• Gel Permeation Chromatography 33%