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ScAlMgO
4
: An oxide substrate for GaN epitaxy
E. S. Hellman
, C. D. Brandle
, L. F. Schneemeyer
, D. Wiesmann
, I. Brener
, T. Siegrist
, G. W. Berkstresser
, D. N.E. Buchanan
, E. H. Hartford
Chemistry and Biochemistry
Research output
:
Contribution to journal
›
Article
›
peer-review
24
Scopus citations
Overview
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Dive into the research topics of 'ScAlMgO
4
: An oxide substrate for GaN epitaxy'. Together they form a unique fingerprint.
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Keyphrases
Band Gap
33%
Boule
33%
Congruent Melting
33%
Czochralski Growth
33%
Deposition Conditions
33%
Diffraction
33%
Epitaxial Film
33%
Epitaxial Growth
33%
Epitaxy
33%
GaN Epitaxy
100%
GaN Films
33%
GaN Surface
33%
In-plane Alignment
33%
Misfit
33%
Molecular Beam Epitaxy
33%
Nitrogen Plasma
33%
Oxide Substrates
100%
Photoluminescence
33%
Reflection High-energy Electron Diffraction
66%
ScAlMgO4
100%
Thermal Expansion Measurements
33%
Material Science
Crystal Growth From Melt
33%
Epitaxial Film
33%
Epitaxy
100%
Film
66%
Molecular Beam Epitaxy
33%
Oxide Compound
100%
Photoluminescence
33%
Reflection High-Energy Electron Diffraction
66%
Superlattice
33%
Thermal Expansion
33%